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material fabrication

Low-Dimensional Copper Halide Dcintillators for X-Ray Imaging and Dosimetry

Murilo Calil Faleiros, Ph.D. Student, Electrical and Computer Engineering
Oct 29, 15:00 - 16:00

B4/5 A0215

material fabrication scintillators halides microdoping X-ray Imaging

This thesis investigates the material, fabrication, and system-level barriers limiting the deployment of low-dimensional copper halide scintillators for X-ray detection to achieve high-performance, low-cost, and application-ready imaging, dosimetry, timing, and quality-assurance technologies.

Wafer-Scale Fabrication of 2D Materials based Memristive Crossbar Arrays with Record Electrical Performance

Prof. Mario Lanza, Nanoelectronics, Soochow University

Nov 11, 15:45 - 17:00

B2 L5 R5209

material fabrication memristive crossbar arrays

In this seminar, I will present the first wafer-scale statistical analysis of memristive crossbar arrays made of 2D layered materials. By using chemical vapor deposited multilayer hexagonal boron nitride (h-BN) sheets, we have fabricated metal/h-BN/metal memristive crossbar arrays that exhibit high yield ~98%, and low device-to-device variability. The devices showed record electrical performance, including stable operation at ultra-low currents down to 110 fA in low resistive state, ON/OFF current ratios up to 1011, record non-linearity of

Computer Science (CS)

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